Nealey Group

Guoliang Liu

  • Assistant Professor of Chemistry at Virginia Tech

  • Contact: gliu1@vt.edu

Liu earned a bachelor’s degree in chemical engineering from Zhejiang University (P. R. China) in 2005. Before completing his doctorate in chemical engineering from the University of Wisconsin-Madison (advisor, Dr. Paul F. Nealey), his research was recognized by the industry and he worked at HGST, a Western Digital company (California) in 2010 to apply his findings on 15-nm block copolymer lithography in magnetic data storage. After completing his doctorate in 2011, he conducted postdoctoral research at Northwestern University (advisor, Dr. Chad A. Mirkin), where he was named an outstanding researcher in the International Institute for Nanotechnology (IIN). He joined as an Assistant Professor in the Department of Chemistry and an Affiliated Professor in the Department of Chemical Engineering at Virginia Tech in Autumn 2014.

Liu has four patents assigned to Western Digital and one patent licensed to Intel.

The Role of Water Volume Fraction on Water Adsorption in Anion Exchange Membranes

Gervasio Zaldivar, Ruilin Dong, Joan M Montes de Oca, Ge Sun, Riccardo Alessandri, Christopher G Arges, Shrayesh N Patel, Paul F Nealey, Juan J de Pablo, Macromolecules, 2025

Role of Crosslinking and Backbone Segmental Dynamics on Ion Transport in Hydrated Anion-Conducting Polyelectrolytes

Zhongyang Wang, Kai Wang, Christopher Eom, Yuxi Chen, Ge Sun, Mincheol Kim, Joan M Montes de Oca, Dongyue Liang, Kushal Bagchi, Shrayesh N Patel, Juan J de Pablo, Paul F Nealey, Advanced Functional Materials, 2025

IEC-Independent Coupling between Water Uptake and Ionic Conductivity in Anion-Conducting Polymer Films

Joan M Montes de Oca, Ruilin Dong, Gervasio Zaldivar, Ge Sun, Zhongyang Wang, Shrayesh N Patel, Paul F Nealey, Juan J de Pablo, Macromolecules, 2025

Water-mediated ion transport in an anion exchange membrane

Zhongyang Wang, Ge Sun, Nicholas HC Lewis, Mrinmay Mandal, Abhishek Sharma, Mincheol Kim, Joan M Montes de Oca, Kai Wang, Aaron Taggart, Alex B Martinson, Paul A Kohl, Andrei Tokmakoff, Shrayesh N Patel, Paul F Nealey, Juan J de Pablo. Nature Communications. 2025.

Directed self-assembly of block copolymer films on atomically-thin graphene chemical patterns

Chang, TH; Xiong, SS; Jacobberger, RM; Mikael, S; Suh, HS; Liu, CC; Geng, DL; Wang, XD; Arnold, MS; Ma, ZQ; Nealey, PF. Directed self-assembly of block copolymer films on atomically-thin graphene chemical patterns. Scientific Reports. 2016. Vol. 6, Pg. 31407.

Directed self-assembly of high-chi block copolymer for nano fabrication of bit patterned media via s

Xiong, S. S. Chapuis, Y. A. Wan, L. Gao, H. Li, X. Ruiz, R. Nealey, P. F.. Directed self-assembly of high-chi block copolymer for nano fabrication of bit patterned media via s. Nanotechnology. 2016. Vol. 27, Pg. 415601.

Directed Self-Assembly of Triblock Copolymer on Chemical Patterns for Sub-10-nm Nanofabrication via

Xiong, SS; Wan, L; Ishida, Y; Chapuis, YA; Craig, GSW; Ruiz, R; Nealey, PF. Directed Self-Assembly of Triblock Copolymer on Chemical Patterns for Sub-10-nm Nanofabrication via. ACS Nano. 2016. Vol. 10, Pg. 7855–7865.

Roadmap on optical metamaterials

Urbas, A. M. Jacob, Z. Dal Negro, L. Engheta, N. Boardman, A. D. Egan, P. Khanikaev, A. B. Menon, V. Ferrera, M. Kinsey, N. DeVault, C. Kim, J. Shalaev, V. Boltasseva, A. Valentine, J. Pfeiffer, C. Grbic, A. Narimanov, E. Zhu, L. X. Fan, S. H. Alu, A. Poutrina, E. Litchinitser, N. M. Noginov, M. A. MacDonald, K. F. Plum, E. Liu, X. Y. Nealey, P. F. Kagan, C. R. Murray, C. B. Pawlak, D. A. Smolyaninov, I. I. Smolyaninova, V. N. Chanda, D.. Roadmap on optical metamaterials. Journal of Optics. Vol. 18, Pg. 093005.

Post-directed-self-assembly membrane fabrication for in situ analysis of block copolymer structures

J Ren, L E Ocola, R Divan, D A Czaplewski, T Segal-Peretz, S Xiong, R J Kline, C G Arges and P F Nealey. Post-directed-self-assembly membrane fabrication for in situ analysis of block copolymer structures. Nanotechnology. 2016. Vol. 27, Pg. 435303.

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