Dr. Wan received his PhD in polymer chemistry and physics from Zhejiang University of China in 2007 and then joined the Department of Polymer Science and Engineering of Zhejiang University as an Assistant Professor. Now he is an Associate Professor and Qiushi Young Scholar at Zhejiang University. His research interests include polymer separation membranes and patterned porous films.
He joined the Nealey group in September 2012 as a postdoctoral researcher and one of the first members of the Pritzker School of Molecular Engineering. He returned to China in September 2013 to his original position at Zhejiang University.
Directed self-assembly (DSA) of block copolymers (BCP) on lithographically-defined nanopatterned surfaces enhances and augments the resolution and patterning properties of traditional lithographic resists and process flows. In DSA, the period of the chemical pre-pattern (Ls) is typically an integral multiple of the natural period of the BCP (Lo). Although great advances in controlled/living polymerization techniques have been made in recent years, it is still difficult to synthesize BCPs with a given period of nanometer precision. Furthermore, other strategies to formulate BCP materials to target a specific Lo may prove in the long-run to provide more reproducible results in manufacturing. Blending BCP with homopolymers is a simple and effective method to adjust the periods and regulate the volume fractions of the two blocks. Dr. Wan is investigating the DSA of ternary blends of poly(styrene-b-methyl methacrylate) (PS-b-PMMA) and its corresponding homopolymers.
The use of topcoats in directing the self-assembly of high-χ (Flory-Huggins interaction parameter) BCPs is very promising and has attracted considerable interest in fabricating sub-10-nm size films. These films can form perpendicular structures via thermal annealing only when the top surface is under a neutral condition, which can be achieved using topcoats. However, the present knowledge of BCP DSA is based on systems without topcoats. Dr. Wan is also working on comparing the dynamics of self-assembly of PS-b-PMMA with and without topcoats.
The Role of Water Volume Fraction on Water Adsorption in Anion Exchange Membranes
Gervasio Zaldivar, Ruilin Dong, Joan M Montes de Oca, Ge Sun, Riccardo Alessandri, Christopher G Arges, Shrayesh N Patel, Paul F Nealey, Juan J de Pablo, Macromolecules, 2025
Role of Crosslinking and Backbone Segmental Dynamics on Ion Transport in Hydrated Anion-Conducting Polyelectrolytes
Zhongyang Wang, Kai Wang, Christopher Eom, Yuxi Chen, Ge Sun, Mincheol Kim, Joan M Montes de Oca, Dongyue Liang, Kushal Bagchi, Shrayesh N Patel, Juan J de Pablo, Paul F Nealey, Advanced Functional Materials, 2025
IEC-Independent Coupling between Water Uptake and Ionic Conductivity in Anion-Conducting Polymer Films
Joan M Montes de Oca, Ruilin Dong, Gervasio Zaldivar, Ge Sun, Zhongyang Wang, Shrayesh N Patel, Paul F Nealey, Juan J de Pablo, Macromolecules, 2025
Water-mediated ion transport in an anion exchange membrane
Zhongyang Wang, Ge Sun, Nicholas HC Lewis, Mrinmay Mandal, Abhishek Sharma, Mincheol Kim, Joan M Montes de Oca, Kai Wang, Aaron Taggart, Alex B Martinson, Paul A Kohl, Andrei Tokmakoff, Shrayesh N Patel, Paul F Nealey, Juan J de Pablo. Nature Communications. 2025.
Directed self-assembly of block copolymer films on atomically-thin graphene chemical patterns
Chang, TH; Xiong, SS; Jacobberger, RM; Mikael, S; Suh, HS; Liu, CC; Geng, DL; Wang, XD; Arnold, MS; Ma, ZQ; Nealey, PF. Directed self-assembly of block copolymer films on atomically-thin graphene chemical patterns. Scientific Reports. 2016. Vol. 6, Pg. 31407.
Directed self-assembly of high-chi block copolymer for nano fabrication of bit patterned media via s
Xiong, S. S. Chapuis, Y. A. Wan, L. Gao, H. Li, X. Ruiz, R. Nealey, P. F.. Directed self-assembly of high-chi block copolymer for nano fabrication of bit patterned media via s. Nanotechnology. 2016. Vol. 27, Pg. 415601.
Directed Self-Assembly of Triblock Copolymer on Chemical Patterns for Sub-10-nm Nanofabrication via
Xiong, SS; Wan, L; Ishida, Y; Chapuis, YA; Craig, GSW; Ruiz, R; Nealey, PF. Directed Self-Assembly of Triblock Copolymer on Chemical Patterns for Sub-10-nm Nanofabrication via. ACS Nano. 2016. Vol. 10, Pg. 7855–7865.
Roadmap on optical metamaterials
Urbas, A. M. Jacob, Z. Dal Negro, L. Engheta, N. Boardman, A. D. Egan, P. Khanikaev, A. B. Menon, V. Ferrera, M. Kinsey, N. DeVault, C. Kim, J. Shalaev, V. Boltasseva, A. Valentine, J. Pfeiffer, C. Grbic, A. Narimanov, E. Zhu, L. X. Fan, S. H. Alu, A. Poutrina, E. Litchinitser, N. M. Noginov, M. A. MacDonald, K. F. Plum, E. Liu, X. Y. Nealey, P. F. Kagan, C. R. Murray, C. B. Pawlak, D. A. Smolyaninov, I. I. Smolyaninova, V. N. Chanda, D.. Roadmap on optical metamaterials. Journal of Optics. Vol. 18, Pg. 093005.
Post-directed-self-assembly membrane fabrication for in situ analysis of block copolymer structures
J Ren, L E Ocola, R Divan, D A Czaplewski, T Segal-Peretz, S Xiong, R J Kline, C G Arges and P F Nealey. Post-directed-self-assembly membrane fabrication for in situ analysis of block copolymer structures. Nanotechnology. 2016. Vol. 27, Pg. 435303.