Takahiro did his undergraduate study in material engineering at Tokyo University of Science in Japan, where he studied polymer synthesis. After graduating, he worked at Mitsubishi Rayon Co., Ltd. and then joined Tokyo Ohka Kogyo Co., Ltd. (TOK). Since then, he has been working on the design and synthesis of new polymer and resist patterning for the next generation of resist materials. He joined Professor Nealey’s group at the University of Chicago in October 2014 as a visiting scientist.
Takahiro Dazai is working on investigating the characteristics of polymer brushes and effect on the phase separation of block copolymers for use in the next generation lithographic techniques. Takahiro is also studying the relationship between the chemistry of polymer brushes and defectivity of contact-hole shrink process for the case of the characterization of polymer brushes using cylinder forming PS-b-PMMA block copolymer. He is also involved with the Center for Material Nanoscale Materials at Argonne National Lab, where he is studying techniques for data collection and analysis on polymer nanostructures.
The Role of Water Volume Fraction on Water Adsorption in Anion Exchange Membranes
Gervasio Zaldivar, Ruilin Dong, Joan M Montes de Oca, Ge Sun, Riccardo Alessandri, Christopher G Arges, Shrayesh N Patel, Paul F Nealey, Juan J de Pablo, Macromolecules, 2025
Role of Crosslinking and Backbone Segmental Dynamics on Ion Transport in Hydrated Anion-Conducting Polyelectrolytes
Zhongyang Wang, Kai Wang, Christopher Eom, Yuxi Chen, Ge Sun, Mincheol Kim, Joan M Montes de Oca, Dongyue Liang, Kushal Bagchi, Shrayesh N Patel, Juan J de Pablo, Paul F Nealey, Advanced Functional Materials, 2025
IEC-Independent Coupling between Water Uptake and Ionic Conductivity in Anion-Conducting Polymer Films
Joan M Montes de Oca, Ruilin Dong, Gervasio Zaldivar, Ge Sun, Zhongyang Wang, Shrayesh N Patel, Paul F Nealey, Juan J de Pablo, Macromolecules, 2025
Water-mediated ion transport in an anion exchange membrane
Zhongyang Wang, Ge Sun, Nicholas HC Lewis, Mrinmay Mandal, Abhishek Sharma, Mincheol Kim, Joan M Montes de Oca, Kai Wang, Aaron Taggart, Alex B Martinson, Paul A Kohl, Andrei Tokmakoff, Shrayesh N Patel, Paul F Nealey, Juan J de Pablo. Nature Communications. 2025.
Directed self-assembly of block copolymer films on atomically-thin graphene chemical patterns
Chang, TH; Xiong, SS; Jacobberger, RM; Mikael, S; Suh, HS; Liu, CC; Geng, DL; Wang, XD; Arnold, MS; Ma, ZQ; Nealey, PF. Directed self-assembly of block copolymer films on atomically-thin graphene chemical patterns. Scientific Reports. 2016. Vol. 6, Pg. 31407.
Directed self-assembly of high-chi block copolymer for nano fabrication of bit patterned media via s
Xiong, S. S. Chapuis, Y. A. Wan, L. Gao, H. Li, X. Ruiz, R. Nealey, P. F.. Directed self-assembly of high-chi block copolymer for nano fabrication of bit patterned media via s. Nanotechnology. 2016. Vol. 27, Pg. 415601.
Directed Self-Assembly of Triblock Copolymer on Chemical Patterns for Sub-10-nm Nanofabrication via
Xiong, SS; Wan, L; Ishida, Y; Chapuis, YA; Craig, GSW; Ruiz, R; Nealey, PF. Directed Self-Assembly of Triblock Copolymer on Chemical Patterns for Sub-10-nm Nanofabrication via. ACS Nano. 2016. Vol. 10, Pg. 7855–7865.
Roadmap on optical metamaterials
Urbas, A. M. Jacob, Z. Dal Negro, L. Engheta, N. Boardman, A. D. Egan, P. Khanikaev, A. B. Menon, V. Ferrera, M. Kinsey, N. DeVault, C. Kim, J. Shalaev, V. Boltasseva, A. Valentine, J. Pfeiffer, C. Grbic, A. Narimanov, E. Zhu, L. X. Fan, S. H. Alu, A. Poutrina, E. Litchinitser, N. M. Noginov, M. A. MacDonald, K. F. Plum, E. Liu, X. Y. Nealey, P. F. Kagan, C. R. Murray, C. B. Pawlak, D. A. Smolyaninov, I. I. Smolyaninova, V. N. Chanda, D.. Roadmap on optical metamaterials. Journal of Optics. Vol. 18, Pg. 093005.
Post-directed-self-assembly membrane fabrication for in situ analysis of block copolymer structures
J Ren, L E Ocola, R Divan, D A Czaplewski, T Segal-Peretz, S Xiong, R J Kline, C G Arges and P F Nealey. Post-directed-self-assembly membrane fabrication for in situ analysis of block copolymer structures. Nanotechnology. 2016. Vol. 27, Pg. 435303.