Nealey Group

Takejiro Inoue

Takejiro was born in 1977 and grew up in Chiba, Japan, and moved to Yokohama to study analytical chemistry. After receiving his MS from Keio University in 2002, he joined Toray Industries, Inc. Since then, he has been working on the design and synthesis of new polymer materials for future electronic devices. He joined the Nealey Group as a visiting scientist in April 2013.

Dr. Inoue is working on approaches to replicate extremely fine patterns formed by directed self-assembly of block copolymers. Molecular transfer printing (MTP) is a strong candidate for future high-throughput and high-resolution patterning technique. This process involves transferring a “master” pattern—made by conventional technology, such as photolithography, e-beam, or EUV—from the original substrate to an unlimited number of other “daughter” substrates. Dr. Inoue is currently exploring roll-to-roll (R2R) processing using molecular transfer printing. He is collaborating with researchers at the University of Texas-Austin to develop light-activated cross-linking transfer agents.

The Role of Water Volume Fraction on Water Adsorption in Anion Exchange Membranes

Gervasio Zaldivar, Ruilin Dong, Joan M Montes de Oca, Ge Sun, Riccardo Alessandri, Christopher G Arges, Shrayesh N Patel, Paul F Nealey, Juan J de Pablo, Macromolecules, 2025

Role of Crosslinking and Backbone Segmental Dynamics on Ion Transport in Hydrated Anion-Conducting Polyelectrolytes

Zhongyang Wang, Kai Wang, Christopher Eom, Yuxi Chen, Ge Sun, Mincheol Kim, Joan M Montes de Oca, Dongyue Liang, Kushal Bagchi, Shrayesh N Patel, Juan J de Pablo, Paul F Nealey, Advanced Functional Materials, 2025

IEC-Independent Coupling between Water Uptake and Ionic Conductivity in Anion-Conducting Polymer Films

Joan M Montes de Oca, Ruilin Dong, Gervasio Zaldivar, Ge Sun, Zhongyang Wang, Shrayesh N Patel, Paul F Nealey, Juan J de Pablo, Macromolecules, 2025

Water-mediated ion transport in an anion exchange membrane

Zhongyang Wang, Ge Sun, Nicholas HC Lewis, Mrinmay Mandal, Abhishek Sharma, Mincheol Kim, Joan M Montes de Oca, Kai Wang, Aaron Taggart, Alex B Martinson, Paul A Kohl, Andrei Tokmakoff, Shrayesh N Patel, Paul F Nealey, Juan J de Pablo. Nature Communications. 2025.

Directed self-assembly of block copolymer films on atomically-thin graphene chemical patterns

Chang, TH; Xiong, SS; Jacobberger, RM; Mikael, S; Suh, HS; Liu, CC; Geng, DL; Wang, XD; Arnold, MS; Ma, ZQ; Nealey, PF. Directed self-assembly of block copolymer films on atomically-thin graphene chemical patterns. Scientific Reports. 2016. Vol. 6, Pg. 31407.

Directed self-assembly of high-chi block copolymer for nano fabrication of bit patterned media via s

Xiong, S. S. Chapuis, Y. A. Wan, L. Gao, H. Li, X. Ruiz, R. Nealey, P. F.. Directed self-assembly of high-chi block copolymer for nano fabrication of bit patterned media via s. Nanotechnology. 2016. Vol. 27, Pg. 415601.

Directed Self-Assembly of Triblock Copolymer on Chemical Patterns for Sub-10-nm Nanofabrication via

Xiong, SS; Wan, L; Ishida, Y; Chapuis, YA; Craig, GSW; Ruiz, R; Nealey, PF. Directed Self-Assembly of Triblock Copolymer on Chemical Patterns for Sub-10-nm Nanofabrication via. ACS Nano. 2016. Vol. 10, Pg. 7855–7865.

Roadmap on optical metamaterials

Urbas, A. M. Jacob, Z. Dal Negro, L. Engheta, N. Boardman, A. D. Egan, P. Khanikaev, A. B. Menon, V. Ferrera, M. Kinsey, N. DeVault, C. Kim, J. Shalaev, V. Boltasseva, A. Valentine, J. Pfeiffer, C. Grbic, A. Narimanov, E. Zhu, L. X. Fan, S. H. Alu, A. Poutrina, E. Litchinitser, N. M. Noginov, M. A. MacDonald, K. F. Plum, E. Liu, X. Y. Nealey, P. F. Kagan, C. R. Murray, C. B. Pawlak, D. A. Smolyaninov, I. I. Smolyaninova, V. N. Chanda, D.. Roadmap on optical metamaterials. Journal of Optics. Vol. 18, Pg. 093005.

Post-directed-self-assembly membrane fabrication for in situ analysis of block copolymer structures

J Ren, L E Ocola, R Divan, D A Czaplewski, T Segal-Peretz, S Xiong, R J Kline, C G Arges and P F Nealey. Post-directed-self-assembly membrane fabrication for in situ analysis of block copolymer structures. Nanotechnology. 2016. Vol. 27, Pg. 435303.

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